A Comparative Study on Chinese, Japanese and Indian Patent Competition in Space Industry
- Paper number
IAC-08.D3.5.-E5.5.1
- Author
Dr. Hui Zhao, Beijing Institute of Space Systems Engineering, China
- Year
2008
- Abstract
Patent is an important embodiment of the technology innovation capability of a country or an enterprise. The intellectual property strategy, with the patent competition as the main content, has been publicly recognized as the effective and efficient means to obtain competitive advantages in the international high technology and science competition. This paper investigates 4936 pieces of invention patents and utility model patents in space industry granted by the United States Patent and Trademark Office in the recent ten years to China, Japan and India. And this paper makes, from a comparative view, an analysis to the three countries’ patent competition activities in space industry, from the aspects of national and annual distribution of patent grant, assignee congregation, PCT application, foreign application priority, main technology fields of competition, patent examination period, scope of claims, etc.. By making the comparative analysis of patent statistics, this paper concludes the features of the three countries’ international patent competition activities in space industry in seven aspects: international cooperation, patent family strategy, scope of patent protection, patent application and marketing strategy, technology fields of competition, collaboration innovation across industrial fields, national patent strategy and enterprise patent strategy, and points out the deficiencies existing in China’s international patent competition in space industry compared to Japan and India. Some policy proposals are put forward with finally as to the development of China’s patent resource in space industry.
- Abstract document
- Manuscript document
(absent)