Development of a polysilazane protection coatings against atomic oxygen
- Paper number
IAC-11,C2,6,2,x9714
- Author
Prof. Jingyu Tong, Beijing institute of satellite environment engineering, China
- Year
2011
- Abstract
A polysilazane protection coating against atomic oxygen has been developed by Beijing Institute of Spacecraft Environment Engineering and State Key Lab for Corrosion and Protection of Metals. Polysiloxane is often used to be protective coating against atomic oxygen. After exposing atomic oxygen, a SiO2 film can be formed on polysiloxane coating surface. The SiO2 film is able to protect polysiloxane coating from atomic oxygen erosion. But during SiO2 film is formed, the surface density of polysiloxane coating will be increased. It may cause reduction in bulk of polysiloxane coating and micro-cracks formation in SiO2 film. At the micro-cracks of SiO2 film, “under-cutting” will be occurred under SiO2 film during atomic oxygen impaction. This paper introduces a polysilazane protection coating developed by Beijing Institute of Spacecraft Environment Engineering and State Key Lab for Corrosion and Protection of Metals. After atomic oxygen exposing, Si-N-Si bonds of the polysilazane coating will be broken and Si-O bonds can be formed. A SiO2 film can be produced on its surface. In order to increase thermal stability of the coating, polysilazane solution is processed with cross-linking catalyst. The coating is carried out atomic oxygen-resistance test, ultraviolet-resistance test and thermal shock-resistance test and is analyzed for its thermal stability, surface morphology and surface component. The results show: SiO2 film formed on polysilazane coating is transparent, uniform, flexible and tough. Its micro-cracks is much less than polysiloxane coating’s and its atomic oxygen erosion rate is 10-26cm3/AO. The erosion rate is lower 100 times than polymer substrate. Its atomic oxygen-resistance is better than polysiloxane coating.
- Abstract document
- Manuscript document
(absent)